- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/085 - Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Patent holdings for IPC class G03F 7/085
Total number of patents in this class: 89
10-year publication summary
|
9
|
9
|
3
|
1
|
10
|
6
|
8
|
2
|
7
|
0
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 27102 |
8 |
| Tokyo Ohka Kogyo Co., Ltd. | 1481 |
6 |
| Eastman Kodak Company | 3444 |
5 |
| Toray Industries, Inc. | 6652 |
5 |
| Hitachi Chemical DuPont Microsystems Ltd. | 68 |
5 |
| Agfa Graphics NV | 308 |
4 |
| Sumitomo Chemical Company, Limited | 8808 |
3 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
3 |
| Dongjin Semichem Co., Ltd. | 438 |
3 |
| Merck Patent GmbH | 5909 |
2 |
| Hitachi Chemical Company, Ltd. | 2455 |
2 |
| Mitsubishi Chemical Corporation | 4313 |
2 |
| Boe Technology Group Co., Ltd. | 35384 |
2 |
| Taiyo Holdings Co., Ltd. | 221 |
2 |
| Washington University | 1473 |
2 |
| Resonac Corporation | 2233 |
2 |
| 3m Innovative Properties Company | 18406 |
1 |
| BASF SE | 19740 |
1 |
| LG Chem, Ltd. | 17205 |
1 |
| International Business Machines Corporation | 60644 |
1 |
| Other owners | 29 |